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John S. Petersen founded PAL with a dedicated group of scientists in 1998 as an image design service provider. They took serious issue with the way lithography at the time was being presented: the Maxwell solvers unable to handle real world problems or present real world solutions, the endless hours of computations only to discover that one variable had been left unaccounted for. They wanted to design an image design factory to address the issues in contemporary lithography as well as provide advanced lithography, critical image primitives, and optical proximity correction. Eight years later their meticulous engineering has finally produced and solved the issues that catalyzed the company. EMF3 and IDF are ready to take on the world.