Petersen Advanced lithography

Petersen Advanced Lithography

List of Current Classes

In addition to on-site courses listed below, John also teaches workshops in symposiums that are open to the public. For more information, check out our course schedule

Fundamentals of Microlithography

This course is designed for operators and technicians new to imaging concepts. It provides the basics for understanding and working with photolithography in a production environment.

Course length: Minimum of two days.

Practical Process Design for Microlithography

This course is designed for engineers, scientists, managers and experienced technicians who are sustaining, improving, or designing lithography process who want to thoroughly understand their processes and make them more robust. This is an excellent opportunity to get advice and specific direction on resist processing. Some familiarity with organic chemistry, experimental design and optics is helpful but not required.

Course length: Approximately eight hours with extended versions available.

Extending Semiconductor Lithography Using Image Process Integration

This course discusses routes to extend optical lithography to the 32 nm technology node using proper selection of masks, mask design including choice of optical proximity correction (OPC), exposure tool, illuminator design, and resist design to do image process integration. (Public sessions of this course are administered by PTI Seminars: look for "Advanced Lithography" in their course listing or schedule.)

Course Length: Approximately eight hours with extended versions available.

Custom Training

Courses that meet specific needs of the client are available. Frequently, these are supplements to the standard courses and provide a workshop environment where acquired knowledge is applied to specific technical issues.

Course length: Minimum of three hours

Contact us about setting up a course and for information on fees.