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PAL Publications
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| Title
(Click to view PDF) |
Coauthors | Publication |
| Imaging Study of Positive and Negative Tone Weak Phase-shifted 65 nm Node Contacts | James V. Beach, John S. Petersen, Robert T. Greenway, Mark John Maslow, Susan S. MacDonald, Lee H. Margolis, Gregory P. Hughes | SPIE Microlithography 5754-149 (2005) |
| An Integrated Imaging System for the 45-nm Technology Node Contact Holes Using Polarized OAI, Immersion, Weak PSM, and Negative Resists | John S. Petersen, Mark J. Maslow, Robert T. Greenway | SPIE Microlithography 5754-46 (2005) |
| Resist Requirements in the Era of Resolution Enhancement Techniques | J. S. Petersen, J. D. Byers | SPIE Microlithography 5039-02 (2003) |
| Evaluation of SCAA Mask Technology as a Pathway to the 65 nm Node | James V. Beach, John S. Petersen, Mark J. Maslow, Dave J. Gerold, and Diane McCafferty | SPIE Microlithography 5040-107 (2003) |
| Programmable Lithography Engine, ProLE™, Grid-Type Supercomputer and Its Applications | John S. Petersen, Mark John Maslow, David J. Gerold and Robert T. Greenway | SPIE Microlithography 5040-157 (2003) |
| Robust Methodology for State of the Art Embedded SRAM Bitcell Design |
M. Craig, J. Lund, Nien-Po Chen |
SPIE Microlithography 4692B-72 (2002) |
| Development of a Sub-100nm Integrated Imaging System Using Chromeless Phase-shifting Imaging with Very High NA KrF Exposure and Off-axis Illumination (in "Design and Process Integration for Microelectronics Manufacturing" conference) | W. Conley, B. Roman, L. Litt, K. Lucas, W. Wu, D. Van Den Broeke, J. F. Chen, T. Laidig, K. Wampler, R. Socha, J. van Praagh, R. Droste |
SPIE Microlithography 4692-68 (2002) |
| Development of a Sub-100nm Integrated Imaging System Using Chromeless Phase-shifting Imaging with Very High NA KrF Exposure and Off-axis Illumination (in "Optical Lithography XV" conference) | W. Conley, B. Roman, L. Litt, K. Lucas, W. Wu, D. Van Den Broeke, J. F. Chen, T. Laidig, K. Wampler, R. Socha, J. van Praagh, R. Droste |
SPIE Microlithography 4691-50 (2002) |
| Developing an Integrated Imaging System for the 70nm Node Using High Numerical Aperture ArF Lithography | J. Beach | SPIE Microlithography 4692-39 (2002) |
| Optical lithographic performance and resolution using strong dark-field phase-shifting of discrete patterns (poster) | ||
|
Optical
proximity strategies for desensitizing
lens aberrations |
||
| Multiple pitch transmission and phase analysis of six types of strong phase shifting masks (poster, data) | ||
| Modeling
the impact of thermal history during post-exposure bake on the lithographic performance of chemically amplified resists |
M.D.
Smith C.A. Mack |
|
| High-transmission attenuated PSM: benefits and limitations through a validation study of 33%, 20%, and 6% transmission masks | Nishrin
Kachwala Martin McCallum |
|
| Analytical description of antiscattering and scattering bar assist features | ||
| Resolution enhancement with high-transmission attenuating phase-shift masks | Robert
J. Socha Will E. Conley Xuelong Shi Mircea V. Dusa Fung Jang Chen Kurt E. Wampler Tom L. Laidig Roger F. Caldwell |
|
| Resolution and DOF improvement through the use of square-shaped illumination | Bruce
W. Smith Lena Zavyalova S.G. Smith |
|
| Imaging contrast improvement for 160-nm line features using subresolution assist features with binary, six percent ternary attenuated phase-shift mask with process tuned resist | Nishrin
Kachwala Fung Jang Chen Mike Canjemi Martin McCallum |
|
| Optimization of 300-mm coat, exposure, and develop processes for 180-nm and smaller features | Walter
Swanson Pen Wang Mo Joseph A. Heck |
|
| Considerations for the use of application-specific photoresists | John
L. Sturtevant Benjamin Ho Kevin D. Lucas Chris A. Mack Edward W. Charrier William C. Peterson Nobu Koshiba Gregg A. Barnes |
|
| Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology mode | Martin
McCallum Nishrin Kachwala Robert J. Sosha Fung Jang Chen Tom L. Laidig Bruce W. Smith Ronald L. Gordon Chris A. Mack |
|
| Design and analysis of manufacturable alternating phase-shifting masks | Ronald
L. Gordon Chris A. Mack |
|
| Illumination pupil filtering using modified quadrupole apertures | Bruce
W. Smith Lena Zavyalova |
|
| Aberration evaluation and tolerancing of 193-nm lithographic objective lenses | Bruce
W. Smith James E. Webb Jeff Meute |
|
| Calibration of chemically amplified resist models |
John
L. Sturtevant |
|
