Prior to forming
PAL, John was a Fellow at International Sematech where he led project DELPHI.
DELPHI provided an assessment for using advanced optical techniques for 150
nm and smaller imaging in production. It is during this time that John formalized
the concept of Image Process Integration (IPI), which is the process of optimizing,
in a complementary fashion, all aspects of the microlithography imaging process,
from layout through pattern transfer.
studied the interrelationship of physics and chemistry for the microlithography
imaging process in both production and research environments. Working
first at Texas Instruments, then later at Shipley, he spent over thirteen
years starting a number of various applications, product testing, field
service and product development groups in the United States and in Japan.
After a five-year assignment to SEMATECH,
where he was involved in deep UV resist lithography testing and process
development, he left Shipley and joined International SEMATECH. He was
elected Fellow in 1997.