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Petersen Advanced Lithography offers one- to three-day on-site training courses for basic and advanced semiconductor lithography process development. We can also customize courses to meet your specific needs. All courses are taught by John S. Petersen.
In addition
to on-site courses, John also teaches in workshops and symposiums that
are open to the public; check our course schedule.
Fundamentals of Microlithography
This course is designed for operators and technicians new to imaging concepts. It provides the basics for working in, and understanding, photolithography in a production environment.
Course length:
Minimum of two days
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Practical
Process Design for Microlithography
This course is designed for engineers, scientists, managers and experienced
technicians who are sustaining, improving, or designing lithography processes
who want to thoroughly to understand their processes and make them more
robust. This is an excellent opportunity to get advice and specific direction
on resist processing. Some familiarity with organic chemistry, experimental
design and optics is helpful but not required.
Course length:
Approximately eight hours
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Extending
Semiconductor Lithography Using
Image Process Integration
This course discusses routes to extend optical lithography to the 70 nm
technology node using proper selection of masks, mask design including
choice of optical proximity correction (OPC), exposure tool, illuminator
design, and resist design to do image process
integration.
Public sessions of this course are administered by PTI
Seminars. Look for "Advanced Lithography" in their course
listing or schedule.
Course length:
Approximately eight hours
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Custom
Training
Courses that meet specific needs of the client are available. Frequently,
these are supplements to the standard courses, and provide a workshop
environment where acquired knowledge is applied to specific technical
issues.
Course length:
Minimum of three hours
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Contact
Us about course schedules and fees.
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© 2003 Petersen Advanced Lithography, Inc. |
