PAL Featured in the EE Times!
"Austin, Texas - Petersen Advanced Lithography (PAL) here is tackling mask-imaging problems that must be solved if optical lithography is to be extended to the 65-nanometer node and beyond..."
Read the full Article over at the EE Times.
"Petersen Advanced Lithography Inc. provides solutions for the semiconductor
industry's design-for-yield market, helping semi-conductor IDMs and fabless
companies speed products to market with lower development costs, while
maximizing revenue potential."
study text from PAL's ProLE hardware partner.
Magazine May 2003 Lead Story: Litho simulation start-up wants to keep
chip industry on right track
by MICRO Magazine of John Petersen.
Review newsletter announces ProLE
Click here to view Griff
Resor's May 2002 newsletter describing PAL's Programmable Lithography
Engine, or ProLE™.
ProLE description here.
Note: "Lithography Review" is referenced with
permission from Griff Resor, copyright
2002, all rights reserved. We
encourage you to subscribe to the newsletter (SE 373) by visiting SEMI
here. You can also see the final page in the May newsletter for more
Chrome Alternating Aperture (SCAA) Test Mask now available from PAL and
Benchmark Technology. This new test mask
is an excellent tool for evaluating subwavelength image processing with
minimal pitch dependent phase error.
Back to PAL homepage