Petersen Advanced Lithography

Image Design Factory (IDF)

A combination of distributive-computing and our image designer workbench, Image Design Factory gives you the power to accurately generate massive computational lithography studies with KLA-Tencor's PROLITH™*, then visualize and analyze your results, and finally, with the generated Focus-Exposure Mask summary, see your results and, if desired, pass them onto to third party tools for interactive processing.

IDF gives you the power to examine the data any way you choose.  Use it to compile and organize your results, execute batch experiments using distributed computers, to design, set up, and run massive rigorous litho-simulation experiments, and to trouble shoot experiments in process.  With a simple intuitive graphical interface, IDF is your one stop shop for lithographic computation, and it does it all in a fraction of the time and cost that it takes other lithographic tools.

IDF applications reduce reticle/fab cost and resources to get high yield IC-products to market by:

• Eliminating learning cycles for optical proximity correction (OPC) development, verification, and tuning of 3rd party applications
• Extrapolating to new litho process space using rigorous simulation
• Matching exposure tools by aberrations, pupil trasmission or source shape
• Using computational lithography, design for manufacturing and design for yield
• Generating knowledge to train upstream tools
• Determining image process robustness and yield
• Maximizing bin yield potential by understanding sources of variation and minimizing their impact